ABSTRACT High-density displays are required for the development of virtual and augmented reality devices. However, increasing the pixel resolution can lead to higher electrical pixel

crosstalk, primarily due to a shared hole transport layer. Here we show that a silicone-integrated small-molecule hole transport layer can be patterned at the wafer scale with

microlithography to mitigate electrical pixel crosstalk. This provides high-density pixelation and improved performance of the hole transport layer itself. With this approach, we create

high-fidelity micro-pattern arrays with a resolution of up to 10,062 pixels per inch on a six-inch wafer. The silicone-integrated small-molecule hole transport layer can effectively modulate

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BEING VIEWED BY OTHERS SILICONE ENGINEERED ANISOTROPIC LITHOGRAPHY FOR ULTRAHIGH-DENSITY OLEDS Article Open access 12 December 2022 TOWARDS MICRO-PELED DISPLAYS Article 11 January 2023

ELECTRICALLY DRIVEN MID-SUBMICROMETRE PIXELATION OF INGAN MICRO-LIGHT-EMITTING DIODE DISPLAYS FOR AUGMENTED-REALITY GLASSES Article 25 March 2021 DATA AVAILABILITY The data that support the

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using high triplet energy crosslinkable hole transport materials. _Adv. Funct. Mater._ 29, 1901025 (2019). Article  Google Scholar  Download references ACKNOWLEDGEMENTS D.H.K. acknowledges

support from the Basic Science Research Program (2020R1A2C3014237 and RS-2024-00405818) and the Pioneer Research Center Program (2022M3C1A3081211) of the National Research Foundation of

Korea (NRF) funded by the Ministry of Science and ICT, Korea and the Technology Innovation Program (RS-2024-00441743) funded by the Ministry of Trade, Industry & Energy (MOTIE, Korea).

M.S.K. acknowledges support from the Basic Science Research Program (2021R1A2C2008332) and the Nano & Material Technology Development Program (RS-2024-00445116) of the NRF funded by the

Ministry of Science and ICT, Korea. AUTHOR INFORMATION Author notes * Hyukmin Kweon Present address: Department of Chemical Engineering, Stanford University, Stanford, CA, USA * These

authors contributed equally: Hyukmin Kweon, Seonkwon Kim, Borina Ha. AUTHORS AND AFFILIATIONS * Department of Chemical Engineering, Hanyang University, Seoul, Republic of Korea Hyukmin

Kweon, Borina Ha, Soyeon Lee, Hayoung Oh, Jiyeon Ha & Do Hwan Kim * Department of Chemical and Biomolecular Engineering, Yonsei University, Seoul, Republic of Korea Seonkwon Kim, Minsu

Kang & Jeong Ho Cho * Department of Chemical and Biomolecular Engineering, Sogang University, Seoul, Republic of Korea Seunghan Lee, SeungHwan Roh & Moon Sung Kang * Institute of

Emergent Materials, Sogang University, Seoul, Republic of Korea Moon Sung Kang * Institute of Nano Science and Technology, Hanyang University, Seoul, Republic of Korea Do Hwan Kim *

Clean-Energy Research Institute, Hanyang University, Seoul, Republic of Korea Do Hwan Kim Authors * Hyukmin Kweon View author publications You can also search for this author inPubMed Google

Scholar * Seonkwon Kim View author publications You can also search for this author inPubMed Google Scholar * Borina Ha View author publications You can also search for this author inPubMed

 Google Scholar * Seunghan Lee View author publications You can also search for this author inPubMed Google Scholar * Soyeon Lee View author publications You can also search for this author

inPubMed Google Scholar * SeungHwan Roh View author publications You can also search for this author inPubMed Google Scholar * Hayoung Oh View author publications You can also search for

this author inPubMed Google Scholar * Jiyeon Ha View author publications You can also search for this author inPubMed Google Scholar * Minsu Kang View author publications You can also search

for this author inPubMed Google Scholar * Moon Sung Kang View author publications You can also search for this author inPubMed Google Scholar * Jeong Ho Cho View author publications You can

also search for this author inPubMed Google Scholar * Do Hwan Kim View author publications You can also search for this author inPubMed Google Scholar CONTRIBUTIONS M.S.K., J.H.C. and

D.H.K. supervised this project. H.K., B.H. and D.H.K. conceived the concept. H.K., S.K. and B.H. designed and carried out the experiments. H.K., B.H., So.L., S.H.R., J.H. and D.H.K. analysed

the molecular structure and etching behaviour of SI-HTL. H.K. and B.H. fabricated the high-resolution patterns of SI-HTL. S.K., Se.L., M.K., S.H.R., M.S.K. and J.H.C. evaluated and

interpreted the optoelectronic characteristics of SI-HTL and OLEDs. H.K., S.K. and H.O. fabricated and evaluated the pixel crosstalk of patterned SI-HTL-based OLEDs. All authors discussed

the results and commented on the paper. H.K., S.K., B.H., M.S.K., J.H.C. and D.H.K. co-wrote the paper. CORRESPONDING AUTHORS Correspondence to Moon Sung Kang, Jeong Ho Cho or Do Hwan Kim.

ETHICS DECLARATIONS COMPETING INTERESTS H.K., S.K., B.H., Se.L., M.S.K., J.H.C. and D.H.K. declare their status as inventors on the granted Korean patent (KR 10-2537611) and have filed the

patent application (PCT/KR2023/009730). Additionally, H.K., B.H. and D.H.K. declare their status as inventors on the granted Korean patent (KR 10-2547153) and have filed the patent

application (PCT/KR2023/002902). The other authors declare no competing interests. PEER REVIEW PEER REVIEW INFORMATION _Nature Electronics_ thanks Ching-Fuh Lin, Alper Ulku and the other,

anonymous, reviewer(s) for their contribution to the peer review of this work. ADDITIONAL INFORMATION PUBLISHER’S NOTE Springer Nature remains neutral with regard to jurisdictional claims in

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Electrical pixel crosstalk phenomenon as a function of SI-HTL pixelation. RIGHTS AND PERMISSIONS Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to

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terms of such publishing agreement and applicable law. Reprints and permissions ABOUT THIS ARTICLE CITE THIS ARTICLE Kweon, H., Kim, S., Ha, B. _et al._ Microlithography of hole transport

layers for high-resolution organic light-emitting diodes with reduced electrical crosstalk. _Nat Electron_ 8, 66–74 (2025). https://doi.org/10.1038/s41928-024-01327-5 Download citation *

Received: 09 December 2023 * Accepted: 29 November 2024 * Published: 27 January 2025 * Issue Date: January 2025 * DOI: https://doi.org/10.1038/s41928-024-01327-5 SHARE THIS ARTICLE Anyone

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