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ABSTRACT Silicon-based transistors are approaching their physical limits and thus new high-mobility semiconductors are sought to replace silicon in the microelectronics industry. Both bulk
materials (such as silicon-germanium and III–V semiconductors) and low-dimensional nanomaterials (such as one-dimensional carbon nanotubes and two-dimensional transition metal
dichalcogenides) have been explored, but, unlike silicon, which uses silicon dioxide (SiO2) as its gate dielectric, these materials suffer from the absence of a high-quality native oxide as
a dielectric counterpart. This can lead to compatibility problems in practical devices. Here, we show that an atomically thin gate dielectric of bismuth selenite (Bi2SeO5) can be conformally
formed via layer-by-layer oxidization of an underlying high-mobility two-dimensional semiconductor, Bi2O2Se. Using this native oxide dielectric, high-performance Bi2O2Se field-effect
transistors can be created, as well as inverter circuits that exhibit a large voltage gain (as high as 150). The high dielectric constant (~21) of Bi2SeO5 allows its equivalent oxide
thickness to be reduced to 0.9 nm while maintaining a gate leakage lower than thermal SiO2. The Bi2SeO5 can also be selectively etched away by a wet chemical method that leaves the mobility
of the underlying Bi2O2Se semiconductor almost unchanged. Access through your institution Buy or subscribe This is a preview of subscription content, access via your institution ACCESS
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Read our FAQs * Contact customer support SIMILAR CONTENT BEING VIEWED BY OTHERS A SINGLE-CRYSTALLINE NATIVE DIELECTRIC FOR TWO-DIMENSIONAL SEMICONDUCTORS WITH AN EQUIVALENT OXIDE THICKNESS
BELOW 0.5 NM Article 15 September 2022 SINGLE-CRYSTALLINE VAN DER WAALS LAYERED DIELECTRIC WITH HIGH DIELECTRIC CONSTANT Article 09 March 2023 SCALABLE INTEGRATION OF HYBRID HIGH-_Κ_
DIELECTRIC MATERIALS ON TWO-DIMENSIONAL SEMICONDUCTORS Article 03 August 2023 DATA AVAILABILITY The data that support the plots within this paper and other findings of this study are
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thank G.F. Dong for her help and discussions in measuring dielectric properties. We acknowledge financial support from the National Natural Science Foundation of China (21733001, 21525310,
51672007 and 11974023) and the National Basic Research Program of China (2016YFA0200101). P.G. also acknowledges support from the Key Area R&D Program of Guangdong Province
(2018B010109009) and the Key R&D Program of Guangdong Province (2018B030327001). J.Y. and K.L. were supported by the US Department of Energy (DOE), Office of Science, Basic Energy
Sciences (award no. DE-SC0019025). AUTHOR INFORMATION Author notes * These authors contributed equally: Tianran Li, Teng Tu. AUTHORS AND AFFILIATIONS * Center for Nanochemistry, Beijing
Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Peking University, Beijing, China Tianran
Li, Teng Tu, Jinxiong Wu, Yan Liang, Yichi Zhang, Congcong Zhang, Yumin Dai & Hailin Peng * Electron Microscopy Laboratory, School of Physics and International Center for Quantum
Materials, Peking University, Beijing, China Yuanwei Sun & Peng Gao * Department of Condensed Matter Physics, Weizmann Institute of Science, Rehovot, Israel Huixia Fu & Binghai Yan *
Department of Physics, University of Texas at Austin, Austin, TX, USA Jia Yu & Keji Lai * Key Laboratory of Organic Optoelectronics and Molecular Engineering of the Ministry of
Education, Department of Chemistry, Tsinghua University, Beijing, China Lei Xing, Ziang Wang & Liying Jiao * Key Laboratory of Microelectronic Devices and Circuits, Institute of
Microelectronics, Peking University, Beijing, China Huimin Wang, Rundong Jia, Ming Li & Ru Huang * Tianjin Key Lab for Rare Earth Materials and Applications, Center for Rare Earth and
Inorganic Functional Materials, School of Materials Science and Engineering, National Institute for Advanced Materials, Nankai University, Tianjin, China Jinxiong Wu * Academy for Advanced
Interdisciplinary Studies, Peking University, Beijing, China Congwei Tan * Key Laboratory for the Physics and Chemistry of Nanodevices and Department of Electronics, Peking University,
Beijing, China Chenguang Qiu * Collaborative Innovation Centre of Quantum Matter, Beijing, China Peng Gao Authors * Tianran Li View author publications You can also search for this author
inPubMed Google Scholar * Teng Tu View author publications You can also search for this author inPubMed Google Scholar * Yuanwei Sun View author publications You can also search for this
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can also search for this author inPubMed Google Scholar * Yan Liang View author publications You can also search for this author inPubMed Google Scholar * Yichi Zhang View author
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View author publications You can also search for this author inPubMed Google Scholar * Chenguang Qiu View author publications You can also search for this author inPubMed Google Scholar *
Ming Li View author publications You can also search for this author inPubMed Google Scholar * Ru Huang View author publications You can also search for this author inPubMed Google Scholar *
Liying Jiao View author publications You can also search for this author inPubMed Google Scholar * Keji Lai View author publications You can also search for this author inPubMed Google
Scholar * Binghai Yan View author publications You can also search for this author inPubMed Google Scholar * Peng Gao View author publications You can also search for this author inPubMed
Google Scholar * Hailin Peng View author publications You can also search for this author inPubMed Google Scholar CONTRIBUTIONS H.P. conceived the original idea for the project. T.T. carried
out the synthesis and structural characterizations of the bulk and 2D crystals. The devices were fabricated and measured by T.L., with help from L.X., Z.W., H.W. and R.J. H.F. and B.Y.
carried out the theoretical calculations. The scanning transmission electron microscopy measurements were performed by Y.S. under the direction of P.G. MIM was performed by J.Y. under the
supervision of K.L. The manuscript was written by H.P., T.L., T.T. and J.W. with input from the other authors. All work was supervised by H.P. All authors contributed to the scientific
planning and discussions. CORRESPONDING AUTHOR Correspondence to Hailin Peng. ETHICS DECLARATIONS COMPETING INTERESTS The authors declare no competing interests. ADDITIONAL INFORMATION
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Supplementary Figs. 1–19. RIGHTS AND PERMISSIONS Reprints and permissions ABOUT THIS ARTICLE CITE THIS ARTICLE Li, T., Tu, T., Sun, Y. _et al._ A native oxide high-_κ_ gate dielectric for
two-dimensional electronics. _Nat Electron_ 3, 473–478 (2020). https://doi.org/10.1038/s41928-020-0444-6 Download citation * Received: 08 October 2019 * Accepted: 22 June 2020 * Published:
27 July 2020 * Issue Date: August 2020 * DOI: https://doi.org/10.1038/s41928-020-0444-6 SHARE THIS ARTICLE Anyone you share the following link with will be able to read this content: Get
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